SCIL or Substrate Conformal Imprint Lithography is a cost-effective alternative to other lithography techniques and can be used in the manufacturing of semiconductors, optics, and other photonics products.
SCIL delivers full solutions for proven, high-quality imprints on wafer areas up to 300 mm. It can be used to make patterns with feature sizes down to less than 10 nm and overlay alignment below 1 µm.
SCIL Nanoimprint Solutions helps customers with optimized equipment, consumable materials, and processes for high volume production.
